#Manufacturing

Ushio Opens Orders for LED-Sourced Projection Aligners to Scale Power Semiconductor and MEMS Manufacturing Efficiency

Originally published as: Accepting Orders for the LED Light-Sourced Projection Aligners

EE TimesPublished 2 days ago

AI overview

Fabs upgrading to LED-based projection lithography can lower operating costs and meet stricter environmental regulations while scaling output for power semiconductors and MEMS.

Ushio has officially opened orders for its latest generation of full-field projection aligners within the UX-4 series, specifically targeting high-efficiency lithography for power semiconductors, MEMS sensors, and optical semiconductor devices. As environmental compliance standards tighten around industrial chemical substances and traditional mercury lamps face increased regulatory scrutiny, equipment manufacturers are forced to pivot toward sustainable lighting alternatives without sacrificing production throughput.

For semiconductor fabs and component packaging lines, the integration of high-intensity solid-state LED modules into projection aligners delivers critical operational advantages. These systems maintain high exposure dose rates required for demanding processes like wafer-level packaging (WLP) and bump formation, while eliminating the warm-up and cool-down cycles inherent to mercury lamps. The immediate on/off capability reduces running costs and extends light source lifespan, directly impacting the cost of ownership (CoO) for mid-node and specialty semiconductor manufacturing lines.

Hardware engineering and procurement teams should evaluate how this shift in lithography tooling influences roadmap planning for power device fabrication and sensor packaging. With support for larger 6-inch and 8-inch substrates at higher resolutions, fabs upgrading to LED-based projection systems can achieve tighter overlay tolerances and better yields, easing supply constraints for high-demand power electronics and automotive discretes.

Questions & answers

The UX-4 series is designed primarily for manufacturing power semiconductors, MEMS sensors, optical semiconductors, and devices requiring wafer-level packaging or bump formation.

Discover more